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V. K. Eu
Observed names:
V. Eu,
V.K. Eu
Institution:
Ford Motor Company (United States)
Observed institutions:
University of Southern California,
Ford Motor Company (United States),
RTX (United States),
Raytheon (United States),
Hughes Aircraft (United States)
OpenAlex ID:
A5082365629
Heavily doped p-GaAs grown by low-pressure organometallic vapor phase epitaxy using liquid CCl4
1992
·
L. W. Yang
, P. D. Wright
, et al.
·
Journal of Applied Physics
·
73
Ultrahigh frequency operation of ion-implanted GaAs metal-semiconductor field-effect transistors
1984
·
M. Feng
, H. Kanber
, et al.
·
Applied Physics Letters
·
42
Does the two-dimensional electron gas effect contribute to high-frequency and high-speed performance of field-effect transistors?
1990
·
M. Feng
, C. L. Lau
, et al.
·
Applied Physics Letters
·
39
Cr profiles in semi-insulating GaAs after annealing with and without SiO2 encapsulants in a H2-As4 atmosphere
1980
·
V. Eu
, M. Feng
, et al.
·
Applied Physics Letters
·
30
Impurity induced layer disordering of Si implanted AlxGa1−xAs-GaAs quantum-well heterostructures: Layer disordering via diffusion from extrinsic dislocation loops
1987
·
L. J. Guido
, K. C. Hsieh
, et al.
·
Journal of Applied Physics
·
28
Si-implanted and disordered stripe-geometry AlxGa1−xAs-GaAs quantum well lasers
1985
·
P. Gavrilovic
, K. Meehan
, et al.
·
Applied Physics Letters
·
27
Study of electrical and chemical profiles of Si implanted in semi-insulating GaAs substrate annealed under SiO2 and capless
1981
·
M. Feng
, S. P. Kwok
, et al.
·
Journal of Applied Physics
·
24
Silicon implanted super low-noise GaAs MESFET
1982
·
M. Feng
, V.K. Eu
, et al.
·
Electronics Letters
·
23
Low noise GaAs metal-semiconductor field-effect transistor made by ion implantation
1982
·
M. Feng
, V. K. Eu
, et al.
·
Applied Physics Letters
·
17
Study of cr, si and mn distribution in semi-insulating gaas after annealing with and without SiO2 in an H2-AS4 atmosphere
1981
·
M. Feng
, V. Eu
, et al.
·
Journal of Electronic Materials
·
16
High-efficiency GaAs power MESFETs prepared by ion implantation
1982
·
M. Feng
, H. Kanber
, et al.
·
Electronics Letters
·
12
Correlation between chemical and electrical profiles in Si+, Se+ and S+ implanted bulk and epitaxial GaAs
1982
·
H. Kanber
, M. Feng
, et al.
·
Journal of Electronic Materials
·
10
Heteroepitaxial In0.1Ga0.9As metal-semiconductor field-effect transistors fabricated on GaAs and Si substrates
1989
·
G. W. Wang
, C. Ito
, et al.
·
Applied Physics Letters
·
9
GaAs MESFET's made by ion implantation into MOCVD Buffer layers
1984
·
M. Feng
, V.K. Eu
, et al.
·
IEEE Electron Device Letters
·
9
High performance ion-implanted low noise GaAs MESFET's
1982
·
M. Feng
, V.K. Eu
, et al.
·
IEEE Electron Device Letters
·
8
Low-noise GaAs field-effect transistor made by molecular beam epitaxy
1982
·
M. Feng
, V. K. Eu
, et al.
·
Applied Physics Letters
·
7
An experimental determination of electron drift velocity in 0.5- mu m gate-length ion-implanted GaAs MESFET's
1991
·
M. Feng
, C.L. Lau
, et al.
·
IEEE Electron Device Letters
·
6
High Volume Production Growth of GaAs on Silicon Substrates
1986
·
Chris R. Ito
, M. Feng
, et al.
·
MRS Proceedings
·
5
Optimization of ion-implanted low noise GaAs metal-semiconductor field effect transistors
1984
·
M. Feng
, V. K. Eu
, et al.
·
Journal of Applied Physics
·
5
A low-noise GaAs MESFET made with graded-channel doping profiles
1984
·
M. Feng
, V.K. Eu
, et al.
·
IEEE Electron Device Letters
·
5
Growth and characterization of Si doped vapor phase epitaxial GaAs for mesfet
1982
·
M. Feng
, V. K. Eu
, et al.
·
Journal of Electronic Materials
·
2
Si-doped GaAs by SiCl4-AsCl3 liquid solution in AsCl3/GaAs-Ga/H2 chemical vapor deposition system
1981
·
M. Feng
, V. Eu
, et al.
·
Applied Physics Letters
·
2
CHARACTERIZATION OF ION IMPLANTED GaAs SUPER LOW NOISE FIELD EFFECT TRANSISTOR.
1983
·
M. Feng
, H. Kanber
, et al.
·
1
Multilevel Si doping in GaAs using a single AsCl3:SiCl4 doping source
1982
·
V. Eu
, M. Feng
, et al.
·
Journal of Applied Physics
·
1
A High-Performance, Low-Temperature Self-Aligned Gate E/D Process
1986
·
S. P. Kwok
, Y. Chang
, et al.
·
Technical digest -- IEEE Compound Semiconductor Integrated Circuit Symposium
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Works count:
28
Citation count:
401
H-index:
11
I10-index:
12
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