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Mark Eurlings

Observed names: M. Eurlings, M. F. A. Eurlings, M.F.A. Eurlings
Institution: ASML (Netherlands)
OpenAlex ID: A5025612392
Si/XeF2 etching: Reaction layer dynamics and surface roughening
1996 · M. J. M. Vugts, M. F. A. Eurlings, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 38
Si/XeF2 etching: Temperature dependence
1996 · M. J. M. Vugts, G. L. J. Verschueren, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 31
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Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments
2011 · Gian F. Lorusso, Natalia Davydova, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
2002 · Stephen Hsu, Noel P. Corcoran, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
65-nm full-chip implementation using double dipole lithography
2003 · Stephen D. Hsu, J. Fung Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Illumination optimization of periodic patterns for maximum process window
2002 · Robert Socha, Mark Eurlings, et al. · Microelectronic Engineering · 7
Low-k1 imaging: how low can we go?
2000 · Jo Finders, Mark Eurlings, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Metrology development for extreme ultraviolet lithography: Flare and out-of-band qualification
2011 · G. F. Lorusso, E. Hendrickx, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 6
0.11-μm imaging in KrF lithography using dipole illumination
2001 · Mark Eurlings, Eelco van Setten, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
NXE:3100 full wafer imaging performance and budget verification
2012 · Eelco van Setten, Koen van Ingen Schenau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Development of automatic OPC treatment and layout decomposition for double dipole lithography for low-k1 imaging
2005 · Tsann-Bim Chiou, Alek C. Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Experimental verification of a model-based decomposition method for double dipole lithography
2004 · Mark Eurlings, Stephen D. Hsu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Can DUV take us below 100 nm?
2001 · Jo Finders, Louis Jorritsma, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Double dipole lithography for 65-nm node and beyond: a technology readiness review
2004 · Stephen D. Hsu, Mark Eurlings, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
The Magnitude of Potential Exposure-Tool-Induced Critical Dimension and Overlay Errors in Double Dipole Lithography for the 65-nm and 45-nm Technology Nodes
2004 · Tsann-Bim Chiou, Alek C. Chen, et al. · Japanese Journal of Applied Physics · 1
Potential issues on optical proximity correction (OPQ) using double dipole lithography
2004 · Tsmn-Bim Chiou, S. Hsu, et al. · International Microprocesses and Nanotechnology Conference (MNC)
Sub-10 nm pattern placement verification of quantum tomography freestanding gratings
1998 · M.F.A. Eurlings, J.T.M. van Beek, et al. · Microelectronic Engineering
Fabricage van vrijstaande transmissieroosters ter maskering van een laserveld
1996 · J.T.M. van Beek, M.F.A. Eurlings · TU/e Research Portal
Works count: 18
Citation count: 149
H-index: 7
I10-index: 4
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