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Michael Banasch

Observed name: M. Banasch
Observed institution: Vistec Electron Beam (Germany)
OpenAlex ID: A5085081616
Potential of E-beam lithography for micro- and nano-optics fabrication on large areas
2023 · Uwe D. Zeitner, Michael Banasch, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 23
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Enhanced e-beam pattern writing for nano-optics based on character projection
2012 · E.-Bernhard Kley, Holger Schmidt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 21
Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithography
2017 · Martin Heusinger, Michael Banasch, et al. · Optics Express · 20
Optical metasurfaces made by cell projection lithography
2022 · Mathias Hädrich, Thomas Siefke, et al. · PhotonicsViews · 14
Multi-stencil character projection e-beam lithography: a fast and flexible way for high quality optical metamaterials
2014 · Uwe Huebner, Matthias Falkner, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Investigation and optimization of Rowland ghosts in high efficiency spectrometer gratings fabricated by e-beam lithography
2016 · Martin Heusinger, Michael Banasch, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Efficient fabrication of complex nano-optical structures by E-beam lithography based on character projection
2014 · Uwe D. Zeitner, Torsten Harzendorf, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
The potential of e-beam lithography for micro- and nano-optics on large areas
2023 · Uwe D. Zeitner, Michael Banasch, et al. · SPIE Novel Patterning Technologies · 2
Advanced photomask fabrication by e-beam lithography for mask aligner applications
2016 · T. Weichelt, Y. Bourgin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Fast character projection electron beam lithography for diffractive optical elements
2014 · Torsten Harzendorf, Frank Fuchs, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Sub-nanometer address grid in variable shaped e-beam lithography for efficient inscription of high-precision large-area optical gratings
2025 · Martin Heusinger, Thorsten A. Goebel, et al. · Photonics Research
Diffuse scattering of lamellar optical gratings due to line edge roughness
2018 · Martin Heusinger, Michael Banasch, et al. · Optical Fabrication, Testing, and Metrology
High precision electron-beam-lithography for optical high performance applications
2017 · Martin Heusinger, Michael Banasch, et al. · Common Library Network (Der Gemeinsame Bibliotheksverbund)
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Advanced photomask fabrication by e-beam lithography for mask aligner applications
2016 · Tina Weichelt, Yannick Bourgin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Pointwise process proximity function calibration: PPFexplorer application results
2012 · M. Krueger, M. Banasch, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 15
Citation count: 113
H-index: 7
I10-index: 5
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