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EMD Corporation (Japan)
Alternate names:
EMD Corporation,
株式会社イー・エム・ディー
ROR:
02qtxtt36
OpenAlex ID:
I4405264711
Works
37
Awards
2
Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna
2007
·
Eiji Takahashi
, Yasuaki Nishigami
, et al.
·
Japanese Journal of Applied Physics
·
69
PDF
Production and Control of Large-Area Plasmas for Meters-Scale Flat-Panel-Display Processing with Multiple Low-Inductance Antenna Modules
2007
·
Yuichi Setsuhara
, Kosuke Takenaka
, et al.
·
Plasma Processes and Polymers
·
65
Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units
2006
·
Kosuke Takenaka
, Yuichi Setsuhara
, et al.
·
Japanese Journal of Applied Physics
·
60
Effects of Antenna Size and Configurations in Large-Area RF Plasma Production with Internal Low-Inductance Antenna Units
2006
·
Hiroshige Deguchi
, Hitoshi Yoneda
, et al.
·
Japanese Journal of Applied Physics
·
48
Characterization of Ion Energy Distribution in Inductively Coupled Argon Plasmas Sustained with Multiple Internal-Antenna Units
2008
·
Kosuke Takenaka
, Yuichi Setsuhara
, et al.
·
Japanese Journal of Applied Physics
·
40
PDF
Influence of deposition condition on electrical properties of a-IGZO films deposited by plasma-enhanced reactive sputtering
2018
·
Kosuke Takenaka
, Masashi Endo
, et al.
·
Journal of Alloys and Compounds
·
25
Plasma surface treatment of polymers with inductivity-coupled RF plasmas driven by low-inductance antenna units
2009
·
Yuichi Setsuhara
, Ken Cho
, et al.
·
Thin Solid Films
·
24
Development of Large Area Plasma Reactor Using Multiple Low-Inductance Antenna Modules for Flat Panel Display Processing
2007
·
Yuichi Setsuhara
, Kosuke Takenaka
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
·
22
Properties of Inductively-Coupled Plasmas Driven by Multiple Low-Inductance Internal-Antenna Units
2007
·
Kosuke Takenaka
, Yuichi Setsuhara
, et al.
·
Plasma Processes and Polymers
·
17
Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films
2013
·
Kosuke Takenaka
, Yuichi Setsuhara
, et al.
·
Japanese Journal of Applied Physics
·
14
PDF
Effects of Working Pressure on the Physical Properties of a-InGaZnOxFilms Formed Using Inductively Coupled Plasma-Enhanced Reactive Sputtering Deposition
2016
·
Kosuke Takenaka
, Keitaro Nakata
, et al.
·
IEEE Transactions on Plasma Science
·
10
Effect of Pressure on Inductively-Coupled Plasmas Sustained with Multiple Low-Inductance Internal-Antenna Units
2007
·
Kosuke Takenaka
, Yuichi Setsuhara
, et al.
·
Transactions of the Materials Research Society of Japan
·
9
PDF
Properties of argon/oxygen mixture plasmas driven by multiple internal-antenna units
2008
·
Yuichi Setsuhara
, Kosuke Takenaka
, et al.
·
Surface and Coatings Technology
·
8
Large-area low-damage plasma sources driven by multiple low-inductance-antenna modules for next-generation flat-panel display processes
2008
·
Yuichi Setsuhara
, Kosuke Takenaka
, et al.
·
Surface and Coatings Technology
·
7
High-rate deposition of silicon nitride thin films using plasma-assisted reactive sputter deposition
2019
·
Kosuke Takenaka
, Yuichi Setsuhara
, et al.
·
Thin Solid Films
·
6
Low-temperature formation of high-mobility a-InGaZnOx films using plasma-enhanced reactive processes
2019
·
Kosuke Takenaka
, Masashi Endo
, et al.
·
Japanese Journal of Applied Physics
·
6
PDF
Meters-Scale Large-Area Plasma Sources with Multiple Low-Inductance Antenna Units for Next-Generation Flat-Panel Display Processing
2007
·
Daisuke Tsukiyama
, Kousuke Takenaka
, et al.
·
Transactions of the Materials Research Society of Japan
·
6
PDF
Interface structure of microcrystalline silicon deposited by inductive coupled plasma using internal low inductance antenna
2008
·
H. Kaki
, A. Tomyo
, et al.
·
Surface and Coatings Technology
·
5
Plasma Profiles of Inductively Coupled Plasmas Sustained with Low-Inductance Internal Antenna
2007
·
Kosuke Takenaka
, Takashi Sera
, et al.
·
Plasma Processes and Polymers
·
5
Roles of Atomic Nitrogen/Hydrogen in GaN Film Growth by Chemically Assisted Sputtering with Dual Plasma Sources
2020
·
Atsushi Tanide
, Shohei Nakamura
, et al.
·
ACS Omega
·
4
Hetero-epitaxial growth of a GaN film by the combination of magnetron sputtering with Ar/Cl 2 gas mixtures and a separate supply of nitrogen precursors from a high density radical source
2019
·
Atsushi Tanide
, Shohei Nakamura
, et al.
·
Japanese Journal of Applied Physics
·
4
Plasma-enhanced reactive linear sputtering source for formation of silicon-based thin films
2018
·
Kosuke Takenaka
, Yuichi Setsuhara
, et al.
·
Review of Scientific Instruments
·
4
Transport properties of InSb and InAs0.1Sb0.9 thin films sandwiched between Al0.1In0.9Sb layers grown by molecular beam epitaxy
2009
·
Ichiro Shibasaki
, Hirotaka Geka
, et al.
·
Journal of Crystal Growth
·
4
Analysis of oxygen-based species introduced during plasma assisted reactive processing of a-IGZO films
2023
·
Kosuke Takenaka
, Hiroyuki Hirayama
, et al.
·
Japanese Journal of Applied Physics
·
3
PDF
Radial‐Profile Control of Cylindrical Plasma Source With Multiple Low‐Inductance Antenna Units
2009
·
Kosuke Takenaka
, Yuichi Setsuhara
, et al.
·
Plasma Processes and Polymers
·
3
PDF
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Works count:
37
Citation count:
758
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